Electronic structures and optical properties of HfO2–TiO2 alloys studied by first-principles GGA + U approach*

Project supported by the National Natural Science Foundation of China (Grant Nos. 11672087, 11502058, and 11402252).

Li Jin-Ping1, †, Meng Song-He1, Yang Cheng1, Lu Han-Tao2, Tohyama Takami3
       

(color online) Density of states (DOS) of o-HfO2–TiO2 calculated by use of GGA + Ud (Ud = 8.0 eV) + Up (Up = 6.0 eV). (a) Total DOS, (b) partial DOS of Hf atom, (c) partial DOS of Ti atom, and (d) partial DOS of O atom.