Segregations and desorptions of Ge atoms in nanocomposite Si1−xGex films during high-temperature annealing
Wang Yu1, Yang Meng1, Wang Gang1, Wei Xiao-Xu1, Wang Jun-Zhuan1, Li Yun1, Zou Ze-Wen2, Zheng You-Dou1, Shi Yi1, †
       

Cross-sectional SEM image of the Si1−xGex film annealed at 900 °C.