Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Li Yuan^{1, 2}, Yan Hongwei², Yang Ke², Yao Caizhen², Wang Zhiqiang², Yan Chunyan¹, Zou Xinshu², Yuan Xiaodong², Yang Liming³, Ju Xin^{1, †}

(color online) Comparison of (a) infrared absorption spectra and (e) molecular structure parameters of the prepared samples. Panels (b)–(d) are blow-ups of ν_R, ν_B, and ν_S, respectively.