Angle-resolved x-ray photoelectron spectroscopy study of GeOx growth by plasma post-oxidation
Zhao Zhiqian1, Zhang Jing1, †, Wang Xiaolei2, 3, ‡, Wei Shuhua1, Zhao Chao2, 3, Wang Wenwu2, 3
       

(color online) Areal intensity ratios of Gex+/Ge1+ (x = 3, 4) and (Ge3+ + Ge4+)/Ge1+ as a function of the GeOx thickness for a takeoff angle of 90°.