Angle-resolved x-ray photoelectron spectroscopy study of GeO<sub><i>x</i></sub> growth by plasma post-oxidation

Angle-resolved x-ray photoelectron spectroscopy study of GeO_x growth by plasma post-oxidation

Zhao Zhiqian¹, Zhang Jing^{1, †}, Wang Xiaolei^{2, 3, ‡}, Wei Shuhua¹, Zhao Chao^{2, 3}, Wang Wenwu^{2, 3}

(color online) Areal intensity ratios of Ge³⁺/Ge²⁺ and Ge⁴⁺/Ge²⁺ as a function of the GeO_x thickness for takeoff angles of 35° and 90°.