Angle-resolved x-ray photoelectron spectroscopy study of GeO
x
growth by plasma post-oxidation
Zhao Zhiqian
1
, Zhang Jing
1, †
, Wang Xiaolei
2, 3, ‡
, Wei Shuhua
1
, Zhao Chao
2, 3
, Wang Wenwu
2, 3
(color online) The gate-stack structure of the sample.