Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation

Yu Zhen^{1, 2}, Qi Hong-Ji^{1, †}, Zhang Wei-Li¹, Wang Hu^{1, 2}, Wang Bin^{1, 2}, Wang Yue-Liang^{1, 2}, Huang Hao-Peng^{1, 2}

(color online) The absorptivity coefficient (black line) and temperature (blue line) induced by the 355-nm laser (8 ns, 1.2 J/cm²) for the CeO₂ particulate of different radius surrounded by the silica matrix.