Impact of Al addition on the formation of Ni germanosilicide layers under different temperature annealing<sup>

Impact of Al addition on the formation of Ni germanosilicide layers under different temperature annealing

Meng Xiao-Ran^{1, 2}, Ping Yun-Xia^{1, †}, Yu Wen-Jie², Xue Zhong-Ying², Wei Xing², Zhang Miao², Di Zeng-Feng², Zhang Bo^{2, ‡}, Zhao Qing-Tai³

High resolution XTEM images of NSG layers formed with 3 nm Al at different annealing temperatures: (a) 500 °C, (b) 550 °C, (c) 600 °C, (d) 700 °C.