Impact of Al addition on the formation of Ni germanosilicide layers under different temperature annealing
Meng Xiao-Ran1, 2, Ping Yun-Xia1, †, Yu Wen-Jie2, Xue Zhong-Ying2, Wei Xing2, Zhang Miao2, Di Zeng-Feng2, Zhang Bo2, ‡, Zhao Qing-Tai3
       

XTEM images of NSG layers: (a) w/o Al at 400 °C, (b) 1 nm Al at 400 °C, (c) 3 nm Al at 600 °C.