Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering
Zhang Yue1, Ye Chao1, 2, †, Wang Xiang-Ying3, Yang Pei-Fang1, Guo Jia-Min1, Zhang Su3
       

SEM images of Ag films deposited at 50 W by (a) 27.12 MHz and (b) 13.56 MHz magnetron sputtering.