Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering
Zhang Yue
1
, Ye Chao
1, 2, †
, Wang Xiang-Ying
3
, Yang Pei-Fang
1
, Guo Jia-Min
1
, Zhang Su
3
SEM images of Ag films deposited at 50 W by (a) 27.12 MHz and (b) 13.56 MHz magnetron sputtering.