Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering

Zhang Yue¹, Ye Chao^{1, 2, †}, Wang Xiang-Ying³, Yang Pei-Fang¹, Guo Jia-Min¹, Zhang Su³

Variation of maximum ion energy E_max and ion flux density J_i with the sputtering power.