Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University

Wu Wen-Bin¹, Ren Hai-Tao^{1, †}, Peng Shi-Xiang¹, Xu Yuan¹, Wen Jia-Mei¹, Sun Jiang¹, Zhang Ai-Lin^{1, 2}, Zhang Tao¹, Zhang Jing-Feng¹, Chen Jia-Er^{1, 2}

(color online) The ratio of emission rate coefficients corresponding to He line at 728.13 nm to Ar line at 750.39 nm as a function of the electron temperature.