Studies on the polycrystalline silicon/SiO2 stack as front surface field for IBC solar cells by two-dimensional simulations
Jiang Shuai1, 2, †, Jia Rui1, ‡, Tao Ke1, Hou Caixia1, Sun Hengchao1, Yu Zhiyong3, Li Yongtao1
       

(color online) The recombination rate at the polycrystalline silicon side near the interface between polycrystalline silicon layer and SiO2 layer with different SiO2 thickness. The doping level of polycrystalline silicon is and the thickness of polycrystalline silicon is 10 nm.