Thermal stability and data retention of resistive random access memory with HfO<sub><i>x</i></sub>/ZnO double layers

Thermal stability and data retention of resistive random access memory with HfO_x/ZnO double layers

Lai Yun-Feng^†, Chen Fan, Zeng Ze-Cun, Lin PeiJie, Cheng Shu-Ying, Yu Jin-Ling

(color online) (a) – curves of the LRS of the DL-RRAM at different temperatures, and (b) the intercepts obtained from the curves in panel (a) as a function of .