Thermal stability and data retention of resistive random access memory with HfO
x
/ZnO double layers
Lai Yun-Feng
†
, Chen Fan
, Zeng Ze-Cun
, Lin PeiJie
, Cheng Shu-Ying
, Yu Jin-Ling
(color online) O 1s XPS spectra of the HfO
x
thin films and those deposited on the ZnO.