Thermal stability and data retention of resistive random access memory with HfOx/ZnO double layers
Lai Yun-Feng, Chen Fan, Zeng Ze-Cun, Lin PeiJie, Cheng Shu-Ying, Yu Jin-Ling
       

(color online) O 1s XPS spectra of the HfOx thin films and those deposited on the ZnO.