Thermal stability and data retention of resistive random access memory with HfOx/ZnO double layers
(color online) Temperature-dependence of (a) set voltage and (b) set current of the DL-RRAM and the 30-nm HfOx-based SL-RRAM.
Thermal stability and data retention of resistive random access memory with HfOx/ZnO double layers |
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(color online) Temperature-dependence of (a) set voltage and (b) set current of the DL-RRAM and the 30-nm HfOx-based SL-RRAM. |
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