Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition
Ji Zesheng1, Wang Lianshan1, 2, †, Zhao Guijuan1, Meng Yulin1, Li Fangzheng1, Li Huijie1, Yang Shaoyan1, Wang Zhanguo1
       

(color online) The height distributions of (a) line 2 and (b) line 1 from the AFM micrograph of sample C.