Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition

Ji Zesheng¹, Wang Lianshan^{1, 2, †}, Zhao Guijuan¹, Meng Yulin¹, Li Fangzheng¹, Li Huijie¹, Yang Shaoyan¹, Wang Zhanguo¹

(color online) Reflectance versus time of AlN samples measured at 650 nm.