Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics
Bi Zhen-Hua1, Hong Yi1, Lei Guang-Jiu2, Wang Shuai3, Wang You-Nian4, Liu Dong-Ping1, †
       

(color online) Time-averaged distributions of the electron density in different applied power: (a) 5 kW and (b) 50 kW.