Graphene/Mo2C heterostructure directly grown by chemical vapor deposition*

Project supported by the National Natural Science Foundation of China (Grant Nos. 1402342, 11574338, and 11274333), the Hundred Talents Program of Chinese Academy of Sciences, the International Collaboration and Innovation Program on High Mobility Materials Engineering, Chinese Academy of Sciences (Grant No. KGZD-EW-303), and the "Strategic Priority Research Program (B)" of the Chinese Academy of Sciences (Grant No. XDB04040300).

Deng Rongxuan1, 2, Zhang Haoran1, 2, Zhang Yanhui1, Chen Zhiying1, Sui Yanping1, Ge Xiaoming1, 2, Liang Yijian1, 2, Hu Shike1, 2, Yu Guanghui1, †, Jiang Da1, ‡
       

(color online) OM images of samples after 40 min with methane concentrations of (a) 0.35 sccm, (b) 1 sccm, and (c) 2 sccm, respectively. The inset in panel (c) shows typical Raman spectra of a point on the top of the sample. (d) Schematic diagram of a typical heterostructure growth process. (e) SEM image of graphene and Mo2C morphology under the following conditions: 1-sccm CH4, 200-sccm H2, 1000-sccm Ar, and 40 min; (f) SEM image of Graphene and morphology of Mo2C stacked partially. (g) SEM image of graphene and morphology of Mo2C separated.