Enhanced thermal stability of VCSEL array by thermoelectric analysis-based optimization of mesas distribution<xref rid="cpb_26_6_064204_fn1" ref-type="fn">*</xref> <fn id="cpb_26_6_064204_fn1"> <label>*</label> <p>Project supported by the National Natural Science Foundation of China (Grant Nos. 61434005, 61474118, 61376070, 11404326, and 11674314), the Jilin Provincial Scientific and Technological Development Program, China (Grant No. 20150203011GX), the Changchun Science and Technology Project, Jilin Province, China (Grant No. 15SS02), and the Youth Innovation Promotion Association, Chinese Academy of Sciences (Grant No. 2017260).</p> </fn>

Enhanced thermal stability of VCSEL array by thermoelectric analysis-based optimization of mesas distribution* *

Project supported by the National Natural Science Foundation of China (Grant Nos. 61434005, 61474118, 61376070, 11404326, and 11674314), the Jilin Provincial Scientific and Technological Development Program, China (Grant No. 20150203011GX), the Changchun Science and Technology Project, Jilin Province, China (Grant No. 15SS02), and the Youth Innovation Promotion Association, Chinese Academy of Sciences (Grant No. 2017260).

Zhong Chu-Yu^{1, 2}, Zhang Xing^{1, †}, Liu Di³, Ning Yong-Qiang¹, Wang Li-Jun¹

(color online) Illustration of mesa arrangement on the VCSEL array’s surface. (a) Normal mesa arrangement with mesa center (edge) distance equals 250 μm (100); (b) optimized mesa arrangement. The mesa radius is 75 μm. The mesa center distances: = 250 μm, = 300 μm, and = 150 μm.