Effect of substrate temperature on the morphological, structural, and optical properties of RF sputtered Ge1−xSnx films on Si substrate

Effect of substrate temperature on the morphological, structural, and optical properties of RF sputtered Ge_1−xSn_x films on Si substrate

Mahmodi H^{1, †}, Hashim M R²

X-ray diffraction (XRD) spectra of GeSn alloy sputtered at different substrate temperatures: RT, 140, 160, 180, and 200 °C.