Improvement of reverse blocking performance in vertical power MOSFETs with Schottky–drain-connected semisuperjunctions
Mao Wei1, Wang Hai-Yong1, Wang Xiao-Fei2, †, Du Ming1, Zhang Jin-Feng1, Zheng Xue-Feng1, Wang Chong1, Ma Xiao-Hua1, Zhang Jin-Cheng1, Hao Yue1
(color online) (a) Potential distributions along the line as shown in Fig. 1 corresponding to the devices in Fig. 6(a), and (b) electric field distribution along the line in the SD-D-semi-SJ MOSFET for different Schottky–drain bias voltages corresponding to Fig. 6(b).