Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640 × 512 focal plane array
Hao Hong-Yue
1, 2
, Xiang Wei
1, 2
, Wang Guo-Wei
1, 2
, Xu Ying-Qiang
1, 2
, Han Xi
1, 2
, Sun Yao-Yao
1, 2
, Jiang Dong-Wei
1, 2
, Zhang Yu
1, 2
, Liao Yong-Ping
1, 2
, Wei Si-Hang
1, 2
, Niu Zhi-Chuan
1, 2, †
SEM image of mesa sidewalls etching with photoresist mask and (b) SiO
2
mask.