Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640 × 512 focal plane array
Hao Hong-Yue1, 2, Xiang Wei1, 2, Wang Guo-Wei1, 2, Xu Ying-Qiang1, 2, Han Xi1, 2, Sun Yao-Yao1, 2, Jiang Dong-Wei1, 2, Zhang Yu1, 2, Liao Yong-Ping1, 2, Wei Si-Hang1, 2, Niu Zhi-Chuan1, 2, †
       

SEM image of mesa sidewalls etching with photoresist mask and (b) SiO2 mask.