Total ionizing dose induced single transistor latchup in 130-nm PDSOI input/output NMOSFETs

Fan Shuang^{1, 2}, Hu Zhi-Yuan^{1, †}, Zhang Zheng-Xuan¹, Ning Bing-Xu¹, Bi Da-Wei¹, Dai Li-Hua^{1, 2}, Zhang Meng-Ying^{1, 2}, Zhang Le-Qing^{1, 2}

(color online) curves of commercial H-gate SOI device before and after irradiation under OFF bias condition. The device was measured at with forward and reverse sweep. Scan directions are indicated by the arrows in the figure.