Theoretical investigation of hierarchical sub-wavelength photonic structures fabricated using high-order waveguide-mode interference lithograph
Wang Ru1, Wang Xiangxian1, , Yang Hua1, Qi Yunping2
       

(color online) (a) Simulated magnetic-field component of TM3-mode interference in multilayer film. The simulated electric fields of (b) TE3- and (c) TE4-mode interference in multilayer films. The white lines indicate the interfaces of glass, Ag, photoresist, and air, from top to bottom. The prism RI is 1.85, and the photoresist RI and thickness are 1.7 nm and 700 nm, respectively.