Heteromaterial-gate line tunnel field-effect transistor based on Si/Ge heterojunction
Zhang Shuqin, Liang Renrong, Wang Jing, Tan Zhen, Xu Jun
       

(color online) (a) characteristics of HMG LTFETs with various dopant types and doping concentrations in the gap. The n-type dopants endow the transistor with a flat window. (b) characteristics of HMG LTFETs with an n-type gap with increasing from 1019 cm to 1020 cm . (c) Electron current density diagram in the lateral direction for HMG LTFETs with cm and 1020 cm . (d) Calculated and extracted for HMG LTFETs with n-type gap as functions of .