Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography
Liang Gao-Feng1, 2, Jiao Jiao1, Luo Xian-Gang2, Zhao Qing1, †
       

(color online) Diagrams of Ag film growth in (a) Volmer–Weber mode, (b) Frank–van der Merwe mode, and (c) Stranski–Krastanov mode. SEM images of 20 nm thick Ag film on (d) SiO /Si(100) substrate and (e) PR/SiO /Si(100) substrate, respectively.