Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography

Liang Gao-Feng^{1, 2}, Jiao Jiao¹, Luo Xian-Gang², Zhao Qing^{1, †}

(color online) The relationship between surface roughness and thickness of Ag films corresponding to SiO /Si(100) and PR/SiO /Si(100) substrates. The RMS values of Ag/SiO /Si(100) samples and Ag/PR/SiO /Si(100) samples are denoted by squares and dots with error bars, respectively. Both solid curves represent the possible changing trends of the RMS values.