Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography

Liang Gao-Feng^{1, 2}, Jiao Jiao¹, Luo Xian-Gang², Zhao Qing^{1, †}

(color online) Normalized electric field intensity distribution of 90 nm period grating mask imaged in the PR film. (a) All the surface roughnessnesses of the Ag/PR/Ag structure are 0 nm. (b) The surface roughnesses of the Ag/PR/Ag structure are 0.57 nm/0.32 nm/1.2 nm from top to bottom. (c) The surface roughnesses of the Ag/PR/Ag structure are 0.57 nm/0.45 nm/1.2 nm from top to bottom. (d)–(f) Intensity profiles at the dashed line positions in (a)–(c), respectively.