Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
Sun Xiao-Yan, Zhang Yu-Ru, Li Xue-Chun, Wang You-Nian
       

(color online) Radial distributions of the total ion flux at the substrate surface averaged over one pulse period, for various bias voltages for a pulse frequency of 8 kHz and duty cycle of 40%, in an ICP nitrogen discharge sustained at a current of 16 A and 10 MHz.