Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H–SiC by atomic layer deposition
Tian Li-Xin, Zhang Feng†, , Shen Zhan-Wei, Yan Guo-Guo, Liu Xing-Fang, Zhao Wan-Shun, Wang Lei, Sun Guo-Sheng, Zeng Yi-Ping
       

Variations of thickness and refractive index (at a wavelength of 632 nm) of Al2O3 film with annealing temperature for 1 min in N2 atmosphere.