Large scale fabrication of nitrogen vacancy-embedded diamond nanostructures for single-photon source applications
Jiang Qianqing1, 4, 5, Li Wuxia1, †, 
, Tang Chengchun1, Chang Yanchun1, 5, Hao Tingting1, 5, Pan Xinyu1, Ye Haitao3, Li Junjie1, Gu Changzhi1, 2, 5, ‡,
, Tang Chengchun1, Chang Yanchun1, 5, Hao Tingting1, 5, Pan Xinyu1, Ye Haitao3, Li Junjie1, Gu Changzhi1, 2, 5, ‡, Pillars prepared with the PMMA positive resist approach: (a) diameter 80 nm, period 160 nm; (b) diameter 250 nm, period 500 nm. The scale bar is 2 μm.
