Electron localization in ultrathin films of three-dimensional topological insulators
Liao Jian, Shi Gang, Liu Nan, Li Yongqing†,
       

Sketch of the gapped helical surface states of TIs and the predicted crossover from the WAL to the WL when the ratio Δ/E is varied from 0 to 0.999. (b) Prefactor α obtained from the fit to the simplified HLN equation [see Eq. (1)], which is plotted as a function of the sheet resistivity ρxx for four gate-tunable ultrathin Bi2Se3 or (Bi,Sb)2Te3 films. The data extracted from the experiment are shown in symbols, and the line is a theoretical curve that takes the disorder effect into account.[70] All of the raw data were taken at T = 1.6 K. Panel (a) is adapted from Ref. [37] and panel (b) from Ref. [40].