Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas
Zhao Yan1, Gao Wei1, Xu Bo2, Li Ying-Ai1, Li Hong-Dong1, Gu Guang-Rui2, Yin Hong1, †, 
Deposition rate as a function of H2 content at 400 °C.
