Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N<sub>2</sub>/Ar discharges

Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N₂/Ar discharges

Liang Ying-Shuang, Zhang Yu-Ru, Wang You-Nian^†,

Radial distributions of the axial flux of on the wafer (z = 0 cm) with different dielectric ring thicknesses.