Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N<sub>2</sub>/Ar discharges

Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N₂/Ar discharges

Liang Ying-Shuang, Zhang Yu-Ru, Wang You-Nian^†,

Radial distributions of (a) the electric potential and (b) the axial electric field at the wafer edge (i.e., z = 0 cm and R_r < r < 22.5 cm) with different dielectric ring thicknesses.