Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N2/Ar discharges
Liang Ying-Shuang, Zhang Yu-Ru, Wang You-Nian†,
       

Radial distributions of (a) the accumulated charge density and (b) the axial electric field at the wafer edge (i.e., z = 0 cm and Rr < r < 22.5 cm) with different dielectric ring relative permittivities. In panel (a), the minus sign (–) scale on the vertical axis indicates negative charge accumulation.