Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N<sub>2</sub>/Ar discharges

Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N₂/Ar discharges

Liang Ying-Shuang, Zhang Yu-Ru, Wang You-Nian^†,

Spatial distributions of the N density with different dielectric ring relative permittivities: (a) ε_rr = 3.9, (b) ε_rr = 8.5, (c) ε_rr = 12.5.