Electron trapping properties at HfO2/SiO2 interface, studied by Kelvin probe force microscopy and theoretical analysis
Zhang Man-Hong†, 
Activation energy, extracted through the Arrhenius plot of
Electron trapping properties at HfO2/SiO2 interface, studied by Kelvin probe force microscopy and theoretical analysis |
|
Zhang Man-Hong†,
|
Activation energy, extracted through the Arrhenius plot of |
| |