Depositing aluminum as sacrificial metal to reduce metal–graphene contact resistance
Mao Da-cheng, Jin Zhi†, , Wang Shao-qing, Zhang Da-yong, Shi Jing-yuan, Peng Song-ang, Wang Xuan-yun
       

(a) Mobility extraction using Kim’s model with the measured and fitting data of total resistance versus gate voltage. (b) Distributions of the hole and electron mobilities of the devices with and without the proposed treatment.