Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering
Gao Ming-Wei1, Ye Chao1, 2, †, 
, Wang Xiang-Ying3, He Yi-Song1, Guo Jia-Min1, Yang Pei-Fang1
, Wang Xiang-Ying3, He Yi-Song1, Guo Jia-Min1, Yang Pei-Fang1 2D AFM amplitude error images of a-C films deposited at (a) 60 MHz, 100 W; (b) 60 MHz, 150 W; (c) 60 MHz, 250 W; (d) 13.56 MHz, 100 W; (e) 13.56 MHz, 150 W; and (f) 13.56 MHz, 250 W.
