Properties of n-Ge epilayer on Si substrate with in-situ doping technology
Huang Shi-Hao1, †, , Li Cheng2, Chen Cheng-Zhao3, Wang Chen2, Xie Wen-Ming1, Lin Shu-Yi1, Shao Ming1, Nie Ming-Xing1, Chen Cai-Yun1
       

Room temperature photoluminescences of the n-Ge epilayers and bulk Ge for various doping concentrations.