Characterization of atomic-layer MoS<sub>2</sub> synthesized using a hot filament chemical vapor deposition method

Characterization of atomic-layer MoS₂ synthesized using a hot filament chemical vapor deposition method

Peng Ying-Zi^{1, 2, †,}, Song Yang¹, Xie Xiao-Qiang¹, Li Yuan^{1, 2}, Qian Zheng-Hong², Bai Ru²

(a) A typical XRD pattern for the MoS₂ thin film. (b)–(d) HRTEM images of the atomic-layer MoS₂ films showing the atomic layers of the MoS₂ films and the corresponding EDS spectrum from the region enclosed by the circle of selected area (e). The inset in panel (b) shows the corresponding profile revealing the distance of the interlayer. The inset in panel (c) reveals the corresponding FFT of the HRTEM image. Panel (d) shows the large image of the corresponding area enclosed by the circle in panel (c).