Characterization of atomic-layer MoS<sub>2</sub> synthesized using a hot filament chemical vapor deposition method

Characterization of atomic-layer MoS₂ synthesized using a hot filament chemical vapor deposition method

Peng Ying-Zi^{1, 2, †,}, Song Yang¹, Xie Xiao-Qiang¹, Li Yuan^{1, 2}, Qian Zheng-Hong², Bai Ru²

AFM images and the corresponding height profiles (insets) along the marked directions of the ultrathin films, in the nucleation area (a) and another area (b), respectively.