Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles
Jiang Jin-Long1, †, 
, Wang Yu-Bao1, Wang Qiong1, Huang Hao1, Wei Zhi-Qiang1, Hao Jun-Ying2
, Wang Yu-Bao1, Wang Qiong1, Huang Hao1, Wei Zhi-Qiang1, Hao Jun-Ying2 Variations of field emission current density of the film with applied electric field.
