Control of symmetric properties of metamorphic In
0.27
Ga
0.73
As layers by substrate misorientation
Yu Shu-Zhen
1
, Dong Jian-Rong
1, †,
, Sun Yu-Run
1
, Li Kui-Long
1, 2
, Zeng Xu-Lu
1, 2
, Zhao Yong-Ming
1
, Yang Hui
1
XTEM images of the In
0.27
Ga
0.73
As layers grown on (a) 2° and (b) 7° offcut GaAs substrates.