A uniform doping ultra-thin SOI LDMOS with accumulation-mode extended gate and back-side etching technology
Zhang Yan-Hui
1
, Wei Jie
1
, Yin Chao
1
, Tan Qiao
1
, Liu Jian-Ping
1
, Li Peng-Cheng
1
, Luo Xiao-Rong
1, 2, †,
Schematic diagram of cross section of the AG-BE SOI LDMOS.