Effect of CuPc and Mo |
Capacitance–voltage characteristic of the device with structures (a) ITO/Al(5 nm)/Bphen(20 nm)/CuPc(100 nm)/Bphen(20 nm)/Al (the capacitance peak did not appear at 0 V bias is because the shift of zero point of built-in field) and (b) ITO/Al(5 nm)/Bphen(20 nm)/MoO3(100 nm)/Bphen(20 nm)/Al. |