Chemical modification of silicene

Wang Rong^a), Xu Ming-Sheng^b), Pi Xiao-Dong†^c)

(a) Si 2p XPS line of as-synthesized 4-nm-thick Al-capped silicene, (b) Al 2p XPS line of the 7-nm-thick Al-capped silicene after exposure to air, (c) Si 2p XPS line of the as-synthesized Al₂O₃-capped silicene, and (d) Raman spectrum of the Al₂O₃-capped silicene exposed to air.^{[ 49 ]}